GC-Type Polyimide Carbon-Based Film for Artificial Graphite Production

GC-Type Polyimide Carbon-Based Film – Advanced Precursor for Artificial Graphite Production​​

​​Core Features​​

Engineered specifically for high-temperature graphitization processes (up to 3000°C), our biaxially stretched PI film delivers:

• ​​High Carbon Yield​​: Minimum 65% conversion efficiency

• ​​Precision Orientation​​: 3:1 MD/TD stretch ratio for uniform crystal structure

• ​​Ultra-Low Impurities​​: <50ppm ash content ensures graphite purity

• ​​Thermal Resilience​​: Stable up to 450°C pre-carbonization

• ​​Thickness Options​​: 25-125μm (±3% tolerance) for customized density requirements

​​Technical Specifications​​

​​Critical Applications​​

• ​​Thermal Management​​: Heat spreaders for 5G/LED cooling solutions

• ​​Energy Storage​​: Current collectors for lithium-ion batteries

• ​​Fuel Cell Components​​: Gas diffusion layer substrates

• ​​Aerospace Systems​​: Thermal interface materials for satellites

• ​​Semiconductor Processing​​: High-purity wafer carriers

​​Quality Assurance​​

• Compliant with ​​JIS K 7128​​ and ​​ASTM D882​​ standards

• ​​±1% thickness consistency​​ for reliable graphitization

• ​​Technical support​​ including temperature ramp profiles

• ​​Proprietary formulation​​ minimizes defects during conversion

​​Ordering & Services​​

• ​​Standard Formats​​: 500/1000mm widths × 100-300m lengths

• ​​Core Options​​: 3" or 6" industrial cores

• ​​Special Processing​​:

  • Pre-carbonized films (600°C treated)

  • Custom imidization levels

• ​​Minimum Order​​: 200kg (samples available)

​​Storage Protocol​​

• ​​Shelf Life​​: 6 months from production

• ​​Environment​​: 10-30°C, <60% RH

• ​​Handling​​: Flat storage recommended to prevent creasing