GC-Type Polyimide Carbon-Based Film for Artificial Graphite Production
| Package: | Simple/vertical/suspend/horizontal | Tensile Strength: | ≥200 MPa |
| Dielectric Strength: | ≥100 KV/mm | Volume Resistivity: | ≥1×10¹⁶ Ω·cm |
| Moisture Absorption: | <1.0% (24hrs) | Adhesion to Copper: | ≥1.0 N/mm (peel) |
| High Light: | GC-Type polyimide carbon film,artificial graphite production film,functional carbon-based polyimide film |
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GC-Type Polyimide Carbon-Based Film – Advanced Precursor for Artificial Graphite Production
Core Features
Engineered specifically for high-temperature graphitization processes (up to 3000°C), our biaxially stretched PI film delivers:
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High Carbon Yield: Minimum 65% conversion efficiency
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Precision Orientation: 3:1 MD/TD stretch ratio for uniform crystal structure
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Ultra-Low Impurities: <50ppm ash content ensures graphite purity
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Thermal Resilience: Stable up to 450°C pre-carbonization
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Thickness Options: 25-125μm (±3% tolerance) for customized density requirements
Technical Specifications
Critical Applications
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Thermal Management: Heat spreaders for 5G/LED cooling solutions
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Energy Storage: Current collectors for lithium-ion batteries
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Fuel Cell Components: Gas diffusion layer substrates
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Aerospace Systems: Thermal interface materials for satellites
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Semiconductor Processing: High-purity wafer carriers
Quality Assurance
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Compliant with JIS K 7128 and ASTM D882 standards
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±1% thickness consistency for reliable graphitization
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Technical support including temperature ramp profiles
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Proprietary formulation minimizes defects during conversion
Ordering & Services
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Standard Formats: 500/1000mm widths × 100-300m lengths
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Core Options: 3" or 6" industrial cores
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Special Processing:
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Pre-carbonized films (600°C treated)
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Custom imidization levels
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Minimum Order: 200kg (samples available)
Storage Protocol
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Shelf Life: 6 months from production
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Environment: 10-30°C, <60% RH
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Handling: Flat storage recommended to prevent creasing
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